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Analysis of Al2O3 Coatings Deposited by Atomic Layer Deposition for the Protection of Moisture Sensitive Optoelectronic Packaging Compounds
Gerald Schmidhofer
AMS AG in Cooperation with the Institute of Solid State Physics - TU Graz
11:15 - 12:15 Wednesday 09 December 2020 

Video: https://bigmail.tugraz.at/outgoing/g_schmidhofer_155935_13588/2885_de.html

Thin film barrier technology is a recent research topic for the encapsulation of solar cells and flexible OLEDs. However, so far little effort has been made to use this technology in order to protect moisture sensitive components in optical sensor packages. This talk not only gives insight into the fabrication of Al2O3 thin films by Atomic Layer Deposition but also analyses their performance as a moisture barrier coating.

A transparent epoxy mold compound, typically used in optoelectronic packages, was coated and the quality of the coating was examined before and after temperature cycling tests. Additionally, the influence of the coating on the yellowing of the epoxy after exposure to high temperature loads was observed. In order to unmask the benefit of the coating as a moisture barrier, an electrical Calcium test has been developed. It allowed the comparison of the water vapor transmission rates of the coated and uncoated epoxy from which the moisture ingress into a package concept, that uses an Al2O3 barrier layer, can be simulated.