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 Karl Franzens University Graz

Graz University of Technology 

Nano on the Spot
Prof. Michael Huth
Physikalisches Institut, Goethe-Universität. Frankfurt am Main
17:15 - 18:15 Monday 02 February 2015 TUG P2

Over the last decade, focused electron beam induced deposition (FEBID) has developed into the most versatile technique for direct writing of nanostructures. It uses a focused electron beam which induces dissociation processes on previously adsorbed precursor molecules on a substrate surface, thereby forming a deposit. FEBID has been developed into the leading technology for mask repair in the semiconductor industry and it is also used for circuit editing in the development of ultra large scale integration devices. In parallel to these fundamentally technology-driven applications, FEBID has been recognized as a multi-purpose method for the fabrication of nanostructures with specific electronic functionalities for basic or applied research. This covers such diverse fields as tunable nano-granular metals, magnetic or superconducting nanostructures, as well as different types of sensor structures. The full exploitation of the technological advantages of FEBID depends on a thorough understanding of both, the microscopic processes that underly FEBID and the electronic properties of the structures which are obtained. In my talk I will give an introduction into FEBID and its recent advancements, followed by selected FEBID application examples, such as induced exotic superconducting triplet states in ferromagnetic nanostructures, probing near-interface ferroelectricity in thin films by conductance modulations in FEBID-based nano-granular metal layers, and how FEBID structures can be used in mesoscopic physics.