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SS22 WS22 SS23 WS23 SS24 WS24 Guidelines for Master Students
On the properties of annealed ZnO and organozinc thin films by plasma enhanced-atomic layer deposition Atomic layer deposition (ALD) is a self-limiting vapor-phase technique that allows the deposition of (ultra-)thin films with excellent conformality and sub-nm thickness control. With this method, a variety of inorganic thin films can be produced, ranging from oxides to nitrides and sulfides. By adopting a plasma discharge as one of the reactant in the process (so called plasma enhanced-ALD) the same materials can be achieved at lower temperature (down to room temperature) than classical ALD, thanks to the highly reactive species present in the plasma phase. |