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SS22 WS22 SS23 WS23 SS24 WS24 Guidelines for Master Students
Deposition of thin films: on the way from material properties to device fabrication The development of functional thin films, engineered to achieve all the desired properties, requires advanced growth techniques. A large portfolio of advanced growth techniques will be presented. Successful results in terms of rationally designed micro- and nanoengineered materials will be demonstrated using as a case of study the growth of functional polymers by initiated CVD (iCVD) and of metal oxides by plasma enhanced atomic layer depositon (PEALD). The high versatility of these two techniques in driving application-specific properties into the material, creating a platform for device fabrication will be discussed. |