Institute of Solid State Physics


SS22WS22SS23WS23SS24WS24      Guidelines for Master Students

Deposition of thin films: on the way from material properties to device fabrication
Anna Maria Coclite
11:15 - 12:15 Wednesday 06 March 2019 SE PH01150

The development of functional thin films, engineered to achieve all the desired properties, requires advanced growth techniques. A large portfolio of advanced growth techniques will be presented. Successful results in terms of rationally designed micro- and nanoengineered materials will be demonstrated using as a case of study the growth of functional polymers by initiated CVD (iCVD) and of metal oxides by plasma enhanced atomic layer depositon (PEALD). The high versatility of these two techniques in driving application-specific properties into the material, creating a platform for device fabrication will be discussed.