Institute of Solid State Physics
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SS22 WS22 SS23 WS23 SS24 WS24 Guidelines for Master Students
Atmospheric Pressure Plasma Deposition (APPD) technique to achieve wear resistance films on various substrates Different kind of substrates e.g. 3D printed polyamide (PA12) tensile specimen (rough-, smooth-surface), glass, austenite as well as Si wafer slides have been elected to develop deposition strategies within the atmospheric pressure plasma deposition technique. The main focus of this research is to achieve thin MoS2 films as well as a sufficient adhesion onto the surface. After microtribological characterization tests, the pretest on coated PA12 with few depositions runs indicated non-steady performance with respect to the coefficient of friction (COF). Furthermore, an additional Hexamethyldisiloxane (HMDSO) gas stream was simultaneously injected with the MoS2 powder stream in the plasma jet to act as an adhesion promoter on smooth substrates (glass, austenite, Si wafer). The best adhesion results according to the pull off test (Kapton) were achieved without the HMDSO pretreatment for all substrates of the same batch. Moreover, with exception of the PA12 substrate, the deposition film thickness was determined. Finally, REM as well as EDX images were recorded for the coated PA12. |
