Institute of Solid State Physics


SS22WS22SS23WS23SS24WS24      Guidelines for Master Students

Structural characterization of organic semiconductor thin films using infrared spectroscopy and X-ray diffraction
Nobutaka Shioya
Institute for Chemical Research, Kyoto University
https://tugraz.webex.com/tugraz/j.php?MTID=m2790c3d2a9a49c31369978e2a76de31c
11:15 - 12:15 Wednesday 15 May 2024 

Molecular semiconductors have unique structural properties in thin films, which play a decisive role in determining the material properties in thin-film devices. Therefore, analysis and control of the aggregation structure are of great importance for the development of high-performance electronic devices. For this purpose, a combination of infrared spectroscopy and X-ray diffraction can be used to reveal the molecular orientation and packing in thin films. In this seminar, I will present our recent studies using this technique to analyze the film structure of several molecular semiconductors [1-3].

[1] Shioya, N.; et al. J. Phys. Chem. Lett. 2022, 13 (51), 11918–11924.
[2] Shioya, N.; et al. Appl. Phys. Express 2020, 13 (9), 095505.
[3] Hasegawa, T.; Shioya, N. Bull. Chem. Soc. Jpn. 2020, 93 (9), 1127–1138.