Development of ZnO nanostructures by plasma - ALD
Sarah Dörschlag
11:15 - 12:15 Wednesday 17 January 2018 The topic of my master thesis deals with the development of Zinc Oxide nanostructures by Plasma-Enhanced Atomic Layer Deposition (PEALD) and lithographic techniques.
PEALD is a vapour phase thin film deposition technique, which has several advantages compared to other chemical deposition techniques. Thanks to the high reactivity of the plasma species, the deposition takes place at reduced processing temperature and provides as a result more freedom in the process conditions and material tuning.
The goal of my thesis was to investigate how lithography could be integrated in the process of nanostructuring Zinc Oxide, which is deposited by ALD.
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Institute of Solid State Physics
