Institute of Solid State Physics
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SS22 WS22 SS23 WS23 SS24 WS24 Guidelines for Master Students
Deposition of ZnO on Si substrates using ALD with outlook towards area-selective ALD Nanomaterials, -structuring and -films are important aspects in electronics, optics and medicine. ALD (atomic layer deposition) is a special process to create such thin films in the nanorange. In this work plasma enhanced and thermal ALD was used to deposit ZnO layers on substrates, consisting of Si with native oxide. The properties of the obtained thin films, such as the thickness or chemical composition, were investigated in-situ by ellipsometry and a QCM (quartz crystal micorbalance) sensor as well as ex-situ by XRD (x-ray diffraction), XRR (x-ray reflectometry) and XPS (x-ray photoelectron spectroscopy) measurements. With an outlook to area-selective ALD, which has potential in obtaining nanostructures in thin films, ZnO was also deposited on EGDMA (ethylene glycol dimethylacrylate) and a copolymer, consisting of EGDMA and HEMA (2-hydroxyethylmethacrylat). |
