Institute of Solid State Physics
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SS23 WS23 SS24 WS24 SS25 Guidelines for Master Students
Cold Atmospheric Pressure Plasma Deposition (C-APPD) Thin film technology is a hot topic in research, since it provides plenty of opportunities for industrial demands. Next to various wet-chemical methods, physical and chemical vapour deposition play a major role in that area. Our institute works with a C-APPD, that provides many advantages over other approaches. With that method we work, amongst others, on functionalization of surfaces for reaching properties such as super- hydrophobicity/-hydrophilicity, but also DNA-activity for medical sensor applications. In my talk I will give an overview on our work and show latest results. |
